Electronics and Communication Gate 2014 Set-2 Questions with Answer

Ques 27 GATE 2014 SET-2


Which one of the following field patterns represents a TEM wave travelling in the positive x direction?

A

E = +8ŷ, H = -4ẑ

B

E = -2ŷ, H = -3ẑ

C

E = +2ẑ, H = +2ŷ

D

E = -3ŷ, H = +4ẑ


(d) is the correct answer.

Ques 28 GATE 2014 SET-2


When a silicon diode having a doping concentration of NA = 9 × 1016 cm-3 on p-side and ND = 1 × 1016 cm-3 on n-side is reverse biased, the total depletion width is found to be 3 μm. Given that the permittivity of silicon is 1.04 × 10-12 F/cm, the depletion width on the p-side and the maximum electric field in the depletion region, respectively, are

A

2.7 μm and 2.3 × 105 V/cm

B

0.3 μm and 4.15 × 105 V/cm

C

0.3 μm and 0.42 × 105 V/cm

D

2.1 μm and 0.42 × 105 V/cm


(c) is the correct answer.

Ques 29 GATE 2014 SET-2


For the n-channel MOS transistor shown in the figure, the threshold voltage VTh is 0.8 V. Neglect channel length modulation effects. When the drain voltage VD = 1.6 V, the drain current ID was found to be 0.5 mA. If VD is adjusted to be 2 V by changing the values of R and VDD, the new value of ID (in mA) is

A

0.625

B

0.75

C

1.125

D

1.5


(c) is the correct answer.

Ques 30 GATE 2014 SET-2


For the MOSFETs shown in the figure, the threshold voltage |Vt| = 2 V and (1/2)μCox(W/L) = 0.1 mA/V2. The value of ID (in mA) is _______ .


(0.9) is the correct answer.

Ques 31 GATE 2014 SET-2


A silicon bar is doped with donor impurities ND = 2.25 x 1015 atoms / cm3. Given the intrinsic carrier concentration of silicon at T = 300 K is ni = 1.5 x 1010 cm-3. Assuming complete impurity ionization, the equilibrium electron and hole concentrations are

A

n0 = 1.5 x 1016 cm-3, p0 = 1.5 x 105 cm-3

B

n0 = 1.5 x 1010 cm-3, p0 = 1.5 x 1015 cm-3

C

n0 = 2.25 x 1015 cm-3, p0 = 1.5 x 1010 cm-3

D

n0 = 2.25 x 1015 cm-3, p0 = 1 x 105 cm-3


(d) is the correct answer.

Ques 32 GATE 2014 SET-2


An increase in the base recombination of a BJT will increase

A

the common emitter dc current gain β

B

the breakdown voltage BVCEO

C

the unity-gain cut-off frequency fT

D

the transconductance gm


(b) is the correct answer.

Ques 33 GATE 2014 SET-2


In CMOS technology, shallow P-well or N-well regions can be formed using

A

low pressure chemical vapour deposition

B

low energy sputtering

C

low temperature dry oxidation

D

low energy ion-implantation


(d) is the correct answer.

Ques 34 GATE 2014 SET-2


Assume electronic charge q = 1.6×10-19 C, kT/q = 25 mV and electron mobility μn = 1000 cm2/V-s. If the concentration gradient of electrons injected into a P-type silicon sample is 1×1021/cm4, the magnitude of electron diffusion current density (in A/cm2) is _________.


(4000) is the correct answer.

Ques 35 GATE 2014 SET-2


Consider an abrupt PN junction (at T = 300 K) shown in the figure. The depletion region width Xn on the N-side of the junction is 0.2 μm and the permittivity of silicon (εsi) is 1.044×10-12 F/cm. At the junction, the approximate value of the peak electric field (in kV/cm) is _________.


(31) is the correct answer.

Ques 36 GATE 2014 SET-2


The determinant of matrix A is 5 and the determinant of matrix B is 40. The determinant of matrix AB is ________.


(200) is the correct answer.

Ques 37 GATE 2014 SET-2


Let X be a random variable which is uniformly chosen from the set of positive odd numbers less than 100. The expectation, E[X], is __________.


(50) is the correct answer.

Ques 38 GATE 2014 SET-2


For 0 ≤ t < ∞, the maximum value of the function f(t) = e-t - 2 e-2t occurs at

A

t = loge 4

B

t = loge 2

C

t = 0

D

t = loge 8


(a) is the correct answer.

Ques 39 GATE 2014 SET-2


The value of limx→∞ (1 + 1/x)x is

A

ln2

B

1.0

C

e

D


(c) is the correct answer.

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