EC > GATE 2014 SET-2 > IC Fabrication
In CMOS technology, shallow P-well or N-well regions can be formed using
A
low pressure chemical vapour deposition
B
low energy sputtering
C
low temperature dry oxidation
D
low energy ion-implantation

Correct : d

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Related Topics

CMOS technology shallow P-well N-well GATE EC 2014 low energy ion implantation ion implantation technology low energy ion implantation gate GATE electronics CMOS process technology

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