EC > Gate 2013 SET-2 > IC Fabrication
In IC technology, dry oxidation (using dry oxygen) as compared to wet oxidation (using steam or water vapor) produces
A
superior quality oxide with a higher growth rate
B
inferior quality oxide with a higher growth rate
C
inferior quality oxide with a lower growth rate
D
superior quality oxide with a lower growth rate

Correct : d

Similar Questions

In CMOS technology, shallow P-well or N-well regions can be formed using
#997 MCQ
In MOSFET fabrication, the channel length is defined during the process of
#1061 MCQ
In IC technology, dry oxidation (using dry oxygen) as compared to wet oxidation (using steam or water vapor) produces
#1178 MCQ

Related Topics

No tags found

Unique Visitor Count

Total Unique Visitors

Loading......

Question Options

Contributed by: